The Exicor® GEN Series is a large‑format birefringence measurement system designed for the high‑precision characterisation of display materials, supporting the demanding optical quality requirements of the LCD and flat‑panel display industry.
The Exicor® GEN Series comprises large‑format sample measurement systems built on the proven Exicor low‑level birefringence measurement technology, combined with precision automated motion control to deliver accurate and repeatable inspection. These platforms provide exceptional sensitivity to low‑level birefringence, enabling precise evaluation of Generation 5 and above LCD compensation films, glass substrates, and related display materials.
Designed with scalability and flexibility in mind, the GEN systems support both current and legacy display formats and are backwards compatible with earlier generation models. The system architecture can be readily adapted to larger materials and extended beyond display applications to include industrial sheet materials and commercial window glass.
The GEN5 system offers a scannable area of 1150 mm × 1375 mm and incorporates a patented high‑tension wire grid stage, maximising the measurable sample area while minimising sag and flexure. When equipped with the optional Scan in Motion™ (SIM) high‑speed scanning capability, large samples can be fully characterised in a fraction of conventional scanning times—as little as 12 minutes, depending on the application.
With no moving parts in the optical system, automatic mapping of variable‑sized samples, and a simple, user‑friendly interface, the Exicor® GEN Series provides a robust, high‑throughput solution for both production quality control and advanced materials research and development.
| Retardation Range: | 0.005 to 300 nm | |
| Retardation Resolution / Repeatability1, 2: | 0.001 nm / ± 0.008 nm | |
| Angular Resolution / Repeatability1: | 0.01º / ± 0.05º | |
| Measurement Rate / Time3: | up to 100 pps / sample size dependent | |
| Light Source Wavelength4: | 632.8 nm (HeNe Laser) | |
| Measurement Spot Diameter5: | ~1 mm native (down to 100 µm) | |
| Modulation Technique / Frequency: | Hinds Instruments PEMLabsTM Photoelastic Modulator / 50 kHz | |
| Demodulation Analysis Technique: | Hinds Instruments SignalocTM Lock-in Amplifier | |
| Measurement Units: | nm (retardation), º (angle) | |
The Exicor® platform from Hinds Insrtuments is designed to be highly adaptable, enabling custom configuration to meet the specific requirements of advanced birefringence measurement applications. Originally developed for nanometre‑range, industrialised birefringence measurement, Exicor systems were engineered in recognition that polarisation analysis—particularly birefringence measurement—is frequently driven by application‑specific and non‑standard requirements.
Many customer processes are proprietary in nature and require measurement solutions that can be adapted both quickly and cost‑effectively. To support this, Exicor systems utilise a modular architecture, incorporating configurable optical and electronic subsystems that can be assembled and tailored with minimal non‑recurring engineering (NRE) effort. This approach allows customised system configurations to be delivered efficiently, while maintaining proven performance and measurement reliability.
The Exicor product family includes over three dozen system models, a significant proportion of which represent custom or semi‑custom configurations developed to address specific measurement challenges. This flexibility enables Exicor systems to support a wide range of research, development, and production environments where standard, off‑the‑shelf solutions may not be sufficient.
By combining modular system design with advanced polarisation and birefringence measurement technology, Exicor systems provide users with tailored measurement capability—supporting improved process control, enhanced product performance, and increased competitiveness in precision optics and advanced materials markets.
The Exicor® GEN Series is widely used for quality control metrology in large‑area optical and display material manufacturing. Its exceptional sensitivity to low‑level birefringence enables manufacturers to detect stress‑related optical variations early in the production process, supporting consistent product quality, higher yields, and reduced scrap rates in volume manufacturing environments.
The system is specifically optimised for the inspection and characterisation of display glass and LCD materials, including Generation 5 and above substrates and compensation films used in flat‑panel displays. By precisely measuring birefringence across large areas, the Exicor® GEN Series helps ensure optical uniformity, minimise visual artefacts, and verify material suitability for high‑resolution display applications.
With its large scanning area and adaptable stage design, the Exicor® GEN Series is well suited to the measurement of large and irregularly shaped planar glass and plastic components. This capability supports applications beyond displays, including architectural and functional glazing, where stress‑induced birefringence can affect optical clarity, performance, and long‑term reliability.
The Exicor® GEN Series is also extensively used for low‑level birefringence measurement in plastic films, supporting both display and industrial applications. Accurate characterisation of film uniformity and residual stress is critical for process optimisation, lamination performance, and final product quality in optical film manufacturing.
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