The Exicor® OIA from Hinds Instruments is a premier birefringence measurement system designed for the precise evaluation of lenses, parallel‑faced optics, and curved optical components at both normal and oblique angles of incidence. Built on award‑winning Photoelastic Modulator (PEM) technology, the system enables accurate measurement of optical retardation, birefringence magnitude, fast‑axis orientation, and theoretical residual stress.
Trusted in both research and production environments, the Exicor OIA provides essential insight for the development, qualification, and manufacture of high‑value precision optics, including next‑generation lithographic lenses.
The Exicor® OIA by Hinds Instruments is a birefringence measurement system designed for the evaluation of lenses, parallel‑faced optics, and curved optical components at both normal and oblique angles of incidence. It is used in research and production environments to measure polarization‑related optical properties in high‑precision optics.
The system is based on Photoelastic Modulator (PEM) technology, originally developed by Hinds Instruments for high‑accuracy polarization measurements. PEMs actively modulate the polarization state of a light beam, while dedicated detection and demodulation electronics quantify how an optical component changes that polarization state.
From this measurement, the Exicor OIA determines optical retardation, birefringence magnitude, and fast‑axis orientation between orthogonal polarization states. The data can also be used to evaluate theoretical residual stress within optical materials.
The Exicor OIA is used for the analysis and development of lithographic lenses, lens blanks, and high‑value precision optics, where birefringence at oblique incidence is critical to optical performance. It supports both laboratory research and industrial quality control workflows.
Hinds Instruments’ Exicor OIA technology is deployed by leading organisations involved in the development and manufacture of advanced lithographic optics and precision optical components.
| VIS Retardation measurement range: | 0 to 300+nm | |
| DUV Retardation measurement range: | 0 to 90+nm | |
| VIS Retardation Resolution / Repeatability: | 0.001nm / ±0.03 (up to 3nm, 1% thereafter) | |
| DUV Retardation Resolution / Repeatability: | 0.001nm / ± 0.08 nm (up to 4nm, 2% thereafter) | |
| Retardation Accuracy: | Better than ±0.2nm expected | |
| Angular Resolution / Repeatability: | 0.01° / <±0.5° | |
| VIS Light Source Wavelength: | 632.8nm | |
| DUV Light Source Wavelength: | 193nm | |
| Modulation Technique/Frequency: | PEMLabsTM Photoelastic Modulator / 50/60 kHz | |
| Demodulation Analysis Technique: | Hinds Instruments SignalocTM Lock-in Amplifier | |
The Exicor® platform from Hinds Insrtuments is designed to be highly adaptable, enabling custom configuration to meet the specific requirements of advanced birefringence measurement applications. Originally developed for nanometre‑range, industrialised birefringence measurement, Exicor systems were engineered in recognition that polarisation analysis—particularly birefringence measurement—is frequently driven by application‑specific and non‑standard requirements.
Many customer processes are proprietary in nature and require measurement solutions that can be adapted both quickly and cost‑effectively. To support this, Exicor systems utilise a modular architecture, incorporating configurable optical and electronic subsystems that can be assembled and tailored with minimal non‑recurring engineering (NRE) effort. This approach allows customised system configurations to be delivered efficiently, while maintaining proven performance and measurement reliability.
The Exicor product family includes over three dozen system models, a significant proportion of which represent custom or semi‑custom configurations developed to address specific measurement challenges. This flexibility enables Exicor systems to support a wide range of research, development, and production environments where standard, off‑the‑shelf solutions may not be sufficient.
By combining modular system design with advanced polarisation and birefringence measurement technology, Exicor systems provide users with tailored measurement capability—supporting improved process control, enhanced product performance, and increased competitiveness in precision optics and advanced materials markets.
The Exicor® OIA Birefringence Measurement System is designed for applications where accurate characterization of birefringence at normal and oblique angles of incidence is critical to optical performance. It is widely used in both research and production environments to support the development, qualification, and quality control of high‑precision optical components.
Modern lithographic systems place stringent requirements on optical materials, particularly with respect to birefringence under oblique illumination. The Exicor OIA enables precise measurement of optical retardation, birefringence magnitude, and fast‑axis orientation in lithographic lenses and lens blanks, supporting the development of next‑generation semiconductor manufacturing optics. These measurements help identify birefringence‑induced imaging errors and assess material suitability before final lens fabrication.
For windows, plates, and other parallel‑faced optical components, the Exicor OIA provides high‑sensitivity birefringence measurements at both normal and non‑normal incidence. This capability is essential for evaluating residual stress introduced during material processing, polishing, or coating, and for ensuring consistent optical performance in precision systems.
Curved lenses and complex optical geometries present unique challenges for traditional birefringence measurement techniques. The Exicor OIA is specifically engineered to handle curved optics, enabling reliable polarization measurements where beam incidence varies across the optical surface. This makes the system well suited for high‑value precision optics used in advanced imaging, photonics, and scientific instrumentation.
Built on Hinds Instruments’ award‑winning Photoelastic Modulator (PEM) technology, the Exicor OIA combines measurement precision with robustness for use in both laboratory R&D and high‑throughput production environments. Its ability to quantify birefringence and fast‑axis orientation at oblique angles provides insights that are not accessible with conventional normal‑incidence systems.
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